Low reflection optical reticle and method of making same
US4981331A · kind A · utility
8Cited by
9References
24Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 9, 1988 |
| Grant date | Jan 1, 1991 |
| Priority date | — |
| Expiry date | Sep 9, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improved optical reticle having a high degree of reflection suppression is provided. In accordance with the preferred embodiment of the invention a fused silica reticle substrate is optically contacted with a fused silica cover plate to yield a sandwich optical reticle having virtually zero reflectance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.