Volatile divalent metal alkoxides
US4982019A · kind A · utility
10Cited by
2References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 31, 1989 |
| Grant date | Jan 1, 1991 |
| Priority date | — |
| Expiry date | Jul 31, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/734
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The invention relates to precursors useful for the preparation by CVD of superconducting thin films. The precursors are the volatile alkoxides of the formula M(OR).sub.2, wherein M is selected from the group consisting of Ba, Ca, and Sr, and R is selected from the group consisting of unsubstituted alkyl groups of 6 to 13 carbons and halogen substituted alkyl groups of 3 to 4 carbons wherein the halogen is selected from the group consisting of fluoride and chlorine and at least two of the halogen substitutions are fluorine. The secondary or tertiary alkyl groups are preferred and the tertiary alkyl groups are most preferred.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.