Method and apparatus for controlling the thickness distribution of an interference filter
US4982695A · kind A · utility
5Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 1990 |
| Grant date | Jan 8, 1991 |
| Priority date | — |
| Expiry date | Apr 2, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/044
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The thickness distribution of a vapor deposited layer such as an interference filter having deposited on a moving substrate such as a glass faceplate for a projection television tube, is controlled along an axis in the direction of travel of the substrate by employing at least one rotatable dodger to partially shield the substrate as it passes behind the dodger during deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.