Magnetically enhanced RIE process and apparatus
US4983253A · kind A · utility
20Cited by
9References
42Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 27, 1988 |
| Grant date | Jan 8, 1991 |
| Priority date | — |
| Expiry date | May 27, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32137
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An etching process and apparatus employ a novel magnetic enhancement means and a substantially pure molecular bromine plasma in order to perform in a desired manner for a number of important applications requiring etching of single-crystal and polycrystalline silicon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.