Patent · US Expired

Membrane filter material having excellent organic solvent resistance, method for formation of membrane filter and process for preparation of bismaleimide polymer to be used for membrane filter

US4983717A · kind A · utility

9Cited by
3References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 22, 1989
Grant dateJan 8, 1991
Priority date
Expiry dateAug 22, 2009

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G73/126
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A membrane filter material formed from a solvent resistant bismaleimide polymer which is formed by polymerizing a bismaleimide compound with a perhydrodiaza-type heterocyclic compound and has a main structural skeleton represented by the following formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 represents a lower carbon chain which is linear or contains a methyl group or ethyl group on the side chain, R.sub.5 represents a divalent group containing an aromatic ring, Y is >R< or >N--R--N< in which R is a lower carbon chain, and m is 0 or 1. This bismaleimide polymer can be a membrane filter material having an excellent organic solvent resistance. When this polymer is formed into a hollow fiber or plain film, a high separating and filtering capacity and an excellent organic resistance can be attained. A membrane filter material having an enhanced organic solvent resistance is provided by preparing the bismaleimide polymer by reacting the bismaleimide compound and perhydrodiaza-type heterocyclic compound in a halogen-containing organic solvent in the presence of a small amount of a phenol.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.