Semiconductor manufacturing device
US4986213A · kind A · utility
97Cited by
13References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 28, 1988 |
| Grant date | Jan 22, 1991 |
| Priority date | — |
| Expiry date | Sep 28, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S148/024
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An improved semiconductor processing is desclosed. In the manufacturing process, just formed semiconductor layer undergoes photo annealing and latent dangling bonds are let appear on the surface and gaps, then neutralizer is introduced to the ambience of the semiconductor. The semiconductor thus formed demonstrates SEL effect in place of Staebler-Wronski effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.