Patent · US Expired

Particle source for a reactive ion beam etching or plasma deposition installation

US4987346A · kind A · utility

28Cited by

22References

20Claims

0Family size

Assignee

Leybold GmBH · DE

Inventors

Werner Katzschner · Gelnhausen, DE
Stefan Eichholz · Bohmte, DE
Michael Geisler · Apolda, DE
Michael Jung · Frankfurt am Main, DE

Key dates

Filing date	Jan 18, 1989
Grant date	Jan 22, 1991
Priority date	—
Expiry date	Jan 18, 2009

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/08
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a particle source with which positive, negative, and neutral particles can be generated and applied on a substrate. The particle source comprises a container (26) in which a gas or gas mixture to be ionized is held. Into this container (26) an electromagnetic wave irradiates which preferably is a microwave. A torus-shaped magnetic field, which is generated with the aid of permanent magnets (32, 33) or electromagnets, simultaneously projects into the container (26). With the aid of a special control grid configuration (38, 39, 40) it becomes possible to draw off positive, negative or neutral particles from the container (26).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.