Apparatus for gas-aided dispensing of liquid materials
US4987854A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 12, 1988 |
| Grant date | Jan 29, 1991 |
| Priority date | — |
| Expiry date | Dec 12, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05D11/132
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for depositing liquid material onto a workpiece in the form of a deposit having a desired conformation wherein the material is discharged under pressure from the nozzle of a dispensing gun which can be manipulated by a robot to lay the deposit according to a programmed pattern on the workpiece. One or more gas jets is directed toward the material after the material is discharged from the nozzle to impart a desired conformation to the material deposited on the workpiece. The flow rate of the gas jets is controlled in accordance with the liquid flow rate to maintain substantial uniformity of the conformation of the deposit. The flow rate of the gas jets may also be controlled with reference to a toolspeed signal which varies according to the relative speed between the nozzle and the workpiece as well as an auxiliary signal the latter of which can be used to selectively alter the conformation of the deposit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.