Patent · US Expired

Negative-working radiation-sensitive mixture with polymer having 1,2,3-thiadiazole groups, and recording material produced therefrom

US4988606A · kind A · utility

0Cited by

6References

8Claims

0Family size

Assignee

Hoechst GmbH · DE

Inventors

Werner Prass · Mainz, DE
Rudolf Zertani · Mainz, DE
Juergen Lingnau · Mainz, DE
Norbert Hanold · Mainz, DE

Key dates

Filing date	Oct 12, 1989
Grant date	Jan 29, 1991
Priority date	—
Expiry date	Oct 12, 2009

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/038
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A negative-working radiation-sensitive mixture comprising a binder and a polymer containing 1,2,3-thiadiazole groups is disclosed. The binder is a polyfunctional compound having functional groups that react with ketene. The polymer is a compound obtained by polymerization of a compound of the general formula I ##STR1## in which R is a polymerizable group. If the polymer is a copolymer containing comonomers having functional groups capable of reacting with ketene, the binder can be omitted. The negative-working radiation-sensitive mixture is particularly suitable for UV, electron beam and X-ray lithography.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.