Position measuring apparatus with multiple scanning locations
US4990767A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 22, 1988 |
| Grant date | Feb 5, 1991 |
| Priority date | — |
| Expiry date | Jul 22, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01D5/24404
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measuring device is provided in which a graduated plate is scanned in at least two scanning locations. The scanning signals from the different scanning locations are transmitted to a testing circuit which determines whether the phase displacement between the scanning signals exceeds a limit value. If the limit value is exceeded, one of the scanning locations is weighted higher than the other. The weighting is implemented by increasing the components of the signals from one scanning location while decreasing the components from the signals from the other scanning location.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.