Photoresist stripping compositions
US4992108A · kind A · utility
Inventors
Key dates
| Filing date | Jan 18, 1990 |
| Grant date | Feb 12, 1991 |
| Priority date | — |
| Expiry date | Jan 18, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D3/43
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A non-aqueous biodegradable negative photoresist stripping composition having low toxicity and is operable at temperatures at 85.degree. C. or less which comprises about 85% by weight of an aromatic hydrocarbon solvent of the formula selected from the group consisting of: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each is a member selected from the group consisting of methyl, ethyl n-propyl and isopropyl, and an organic sulfonic acid of the formula: EQU R.sub.3 --SO.sub.3 H wherein R.sub.3 is a member selected from the group consisting of phenyl, tolyl, dodecylbenzene and naphthyl, the ratio of the aromatic solvent to organic solvent acid being about 60 to 96% by weight to about 4 to 40% by weight.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.