Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
US4994346A · kind A · utility
22Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 20, 1988 |
| Grant date | Feb 19, 1991 |
| Priority date | — |
| Expiry date | Jul 20, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a negative photoresist essentially comprising PA1 (a) at least one solid, film-folrming polyphenol, PA1 (b) at least one polyfunctional epoxy resin and/or one polyfunctional vinyl ether compound, each of which can be dissolved, in the uncured state, in aqueous alkaline media with salt formation, PA1 (c) at least one cationic photoinitiator for component (b) and PA1 (d) customary additives, if desired. Components (a) and (b) can also be combined in one molecule. The resist can be developed in aqueous alkaline media.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.