Wet chemical etchant and method for etching high temperature superconductive films
US4997522A · kind A · utility
7Cited by
1References
4Claims
0Family size
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Inventor
Key dates
| Filing date | Aug 18, 1989 |
| Grant date | Mar 5, 1991 |
| Priority date | — |
| Expiry date | Aug 18, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/82
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A system for etching superconducting films of yttrium-barium-copper-oxide (YBa.sub.2 Cu.sub.3 O.sub.2) is disclosed. The etchant comprises ethylenediaminetetraacetic acid of varying concentrations in water or a water/glycerol mixture. The described etchant permits superconducting transition temperatures to remain unaffected within the experimental accuracy of 1.degree. C. Additionally, films do not require reoxygenation after etching, and the etchant is suitable for micropatterning using standard photolithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.