Silver halide photographic light-sensitive material
US4999275A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 1986 |
| Grant date | Mar 12, 1991 |
| Priority date | — |
| Expiry date | Oct 15, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silver halide photographic light-sensitive material is described, comprising a support, at least one light-sensitive silver halide emulsion layer on the support, and at least one light-insensitive top layer provided on the emulsion layer, wherein at least one of the emulsion layer and other constituent layers contains a compound represented by the general formula (I) EQU R.sup.1 --NHNH--G--R.sup.2 (I) wherein R.sup.1 is a substituted or unsubstituted aryl group, R.sup.2 is a hydrogen atom, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted aryloxy group, and G is a carbonyl group, a sulfonyl group, a sulfoxy group, a phosphoryl group, or an N-substituted or unsubstituted imino group and wherein said at least one light-insensitive top layer is hardened so as to have a melting time at least 50 seconds longer than that of the emulsion layer. This material enables the formation of a negative image having super contrast with a stable processing solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.