Particle measuring apparatus
US4999513A · kind A · utility
52Cited by
7References
42Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 5, 1989 |
| Grant date | Mar 12, 1991 |
| Priority date | — |
| Expiry date | Sep 5, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/4707
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This specification discloses a particle measuring apparatus characterized by means for passing a particle to be examined to a portion to be examined. First applying means applies an irradiating light from a first direction to the portion to be examined, second applying means applies an irradiating light from a second direction differing from the first direction to the portion to be examined. First and second photometering means photomets the lights radiated from the portion to be examined by the application of lights to the particle to be examined, relative to the first and second applying means, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.