Photosensitive material containing a photosensitive and heat developable element and a polymerizable layer and image-forming method utilizing the same
US5001032A · kind A · utility
20Cited by
6References
56Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 19, 1989 |
| Grant date | Mar 19, 1991 |
| Priority date | — |
| Expiry date | Dec 19, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0285
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive material comprises a photosensitive layer and a polymerizable layer which are laminated. An area of the polymerizable layer, corresponding to an unexposed area of the photosensitive layer, is polymerized when the photosensitive material is exposed to light with a wavelength of 400 to 900 nm and heated to 60.degree. to 80.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.