Ion implantation apparatus and method of controlling the same
US5003183A · kind A · utility
47Cited by
2References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 1990 |
| Grant date | Mar 26, 1991 |
| Priority date | — |
| Expiry date | May 9, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An ion implantation apparatus comprises: an implantation chamber into which an ion beam is entered, the ion beam being scanned in an X direction; a holder for holding a wafer in the implantation chamber; and a holder drive unit for mechanically scanning the holder in a Y direction substantially perpendicular to the X direction in the implantation chamber. The holder drive unit swingingly rotates the holder so that the wafer is mechanically scanned in the Y direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.