Methods enabling stress crack free patterning of chrome on layers of organic polymers
US5006212A · kind A · utility
17Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 10, 1988 |
| Grant date | Apr 9, 1991 |
| Priority date | — |
| Expiry date | Mar 10, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/16756
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed a method to enable one to deposit a thin layer of chrome to a thicker layer of an organic polymer. The surface of the organic polymer has a thin layer of silicon dioxide deposited thereon and then a thicker layer of chrome is sputtered onto said layer of silicon dioxide. This enables one to pattern and to wire bond to the chrome layer while avoiding stress cracks in the chrome as provided by prior art techniques.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.