Spiral hollow cathode
US5007373A · kind A · utility
16Cited by
7References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 24, 1989 |
| Grant date | Apr 16, 1991 |
| Priority date | — |
| Expiry date | May 24, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J1/025
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A spiral hollow cathode having adjacent layers which are equivalent to a two-dimensional array of small hollow cathodes. The cathode may be used for producing large area electron beams and for plasma-assisted deposition of films such as diamond over a large area without requiring heating external to the plasma itself.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.