Non-planar field emission device having an emitter formed with a substantially normal vapor deposition process
US5007873A · kind A · utility
54Cited by
18References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 9, 1990 |
| Grant date | Apr 16, 1991 |
| Priority date | — |
| Expiry date | Feb 9, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/025
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A cold cathode field emission device having a cone shaped emitter (112, 208) formed with a substantially normal (but not absolutely normal) vapor deposition process (109) wherein the substrate (101, 201) need not be rotated with respect to the vapor deposition target. The vapor deposition process forms an encapsulating layer (111, 207) that can either be utilized as an electrode within the completed device, or that can be removed to allow subsequent construction of additional layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.