Chemically-assisted ion beam milling system for the preparation of transmission electron microscope specimens
US5009743A · kind A · utility
22Cited by
4References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 6, 1989 |
| Grant date | Apr 23, 1991 |
| Priority date | — |
| Expiry date | Nov 6, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N1/32
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An ion beam milling system for the preparation of transmission electron microscope specimens suitable for atomic resolution imaging, particularly of III-V and II-VI compound semiconductors and their alloys, is described. The system includes ion beam sources and reactive molecular gas jets which may be operated in combination or separately, as appropriate. A new heated specimen holder, giving greatly increased reaction rates with the molecular gas jet, allows milling angles very close to zero.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.