Method for applying optical interference coating
US5009920A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 30, 1990 |
| Grant date | Apr 23, 1991 |
| Priority date | — |
| Expiry date | Mar 30, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/153
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Precision multilayer optical interference coating of substrates having complex topology using complementary shaped electrodes and plasma enhanced chemical vapor deposition within a chamber. The materials for the optical quality thin films are obtained from starting reactants of the form M-R where M denotes a metal atom and R denotes an organic component. These vapor phase starting reactants are brought into a reactive atmosphere of the chamber through a plurality of orifices in one of the shaped electrodes. The resulting substances are deposited as thin films upon the substrates with inherently superior scatter loss performance because of the low temperature nature and simple direct vapor-to-solid phase transformation path of the process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.