Outer product optical interferometer with mask
US5012440A · kind A · utility
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10References
3Claims
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Key dates
| Filing date | Mar 1, 1989 |
| Grant date | Apr 30, 1991 |
| Priority date | — |
| Expiry date | Mar 1, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J9/0215
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An outer product shearing interferometer for an optical source of one-dimensional extent which provides simultaneous interference between every two points on the source. The interferometer comprises an input plane containing the source, an output plane for observing the outer product, an imaging system between the two planes, and a mask positioned in the transform plane of the imaging system and having slits arranged to effect the desired outer product. The desired outer product results from a simultaneous application of many lateral shears instead of only one at a time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.