Patent · US Expired

Process for the production of an inverted structure, active matrix display screen

US5015597A · kind A · utility

13Cited by

10References

7Claims

0Family size

Assignee

Centre National d'Etudes des Telecommunications et d'Etudes Spatiales · FR

Inventors

Bruno Vinouze · Port Blanc, FR
Yannick Chouan · Lannion, FR

Key dates

Filing date	Aug 24, 1990
Grant date	May 14, 1991
Priority date	—
Expiry date	Aug 24, 2010

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S438/949
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Process for producing a wall for an active matrix display screen. By a first etching is formed stack rows of layers (L) with a metal at the ttom. The gaps between the rows are filled by a negative polyimide. On the surface are etched columns (C) and blocks (P). These elements serve as a mask for an etching leaving control transistors in a gate configuration below the same. Application to the production of liquid crystal display screens.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.