Lift-off process
US5017459A · kind A · utility
9Cited by
7References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 26, 1989 |
| Grant date | May 21, 1991 |
| Priority date | — |
| Expiry date | Apr 26, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/094
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lift-off process for forming patterned films of particular use for films of metals that need to be deposited in a non-directional fashion. The process features a lift-off mask that includes a thin coating of Brewer Science ARC.RTM. PN-2 as an assisting layer under a photoresist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.