Method for producing thin film of oxide superconductor
US5017550A · kind A · utility
40Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 30, 1988 |
| Grant date | May 21, 1991 |
| Priority date | — |
| Expiry date | Mar 30, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/732
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A thin film of an oxide superconductor having a homogeneous composition and less oxygen defects is produced by independently vaporizing onto a substrate at least one material selected from the group consisting of the elements of Ia, IIa and IIIa groups of the periodic table and their compounds and one material selected from the group consisting of Cu and its compounds and irradiating the substrate with oxygen ions and depositing the vaporized materials together with oxygen on the substrate to form the thin film of the oxide superconductor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.