Low residue antiperspirant creams
US5019375A · kind A · utility
178Cited by
15References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 1989 |
| Grant date | May 28, 1991 |
| Priority date | — |
| Expiry date | Mar 14, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S424/05
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
Antiperspirant cream compositions, which exhibit reduced residue on the skin and excellent cosmetics and aesthetics, as well as good composition stability over time, are claimed. These compositions, which may be formulated to have relatively high viscosities, include a volatile silicone material, a particulate antiperspirant active, a clay thickening agent, an activator for the clay thickening agent, and a non-volatile paraffinic hydrocarbon fluid, such as mineral oil or branched chain C.sub.16 -C.sub.68 hydrocarbons. A method of treating or preventing perspiration in humans using these compositions is also claimed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.