Organometal-containing polymers and use thereof in a photosensitive composition with photoacid generators
US5024916A · kind A · utility
6Cited by
6References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 24, 1990 |
| Grant date | Jun 18, 1991 |
| Priority date | — |
| Expiry date | Sep 24, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Organometal-containing polymers having side chains of the formula I ##STR1## in which, for example, M is Si, X is O, R.sup.1 and R.sup.2 are hydrogen and R.sup.4 to R.sup.6 are each methyl and which have an average molecular weight between 1,000 and 1,000,000, are suitable for the preparation of dry-developable photoresists, such as are required for the generation of structured images, in particular in microelectronics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.