Process for forming a pattern using a photosensitive azide and a high-molecular weight copolymer or polymer
US5024920A · kind A · utility
7Cited by
5References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 23, 1989 |
| Grant date | Jun 18, 1991 |
| Priority date | — |
| Expiry date | May 23, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/012
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention relates to a process for forming a pattern using a photosensitive composition comprising a polymeric azide and a high-molecular weight copolymer or polymer. The photosensitive composition comprises a copolymer containing at least a water-soluble non-photosensitive monomeric unit having an electrolytic functional group, a monomeric unit having an azido group and an electrolytic functional group and a high-soluble high molecular weight copolymer or polymer which exhibits reciprocity law failure characteristic.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.