Oxygen resistant radiation-polymerizable composition and element containing a photopolymer composition
US5026626A · kind A · utility
0Cited by
10References
23Claims
0Family size
Inventors
Key dates
| Filing date | Jun 14, 1990 |
| Grant date | Jun 25, 1991 |
| Priority date | — |
| Expiry date | Jun 14, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/119
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photopolymeriziable composition which comprises poly butane diol diacrylate, a photoinitiator and a binding resin. Upon coating the composition onto a substrate a photographic element is formed which does not require the presence of an oxygen barrier layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.