Photosensitive polymer having thiol group
US5026788A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 2, 1989 |
| Grant date | Jun 25, 1991 |
| Priority date | — |
| Expiry date | Jun 2, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0388
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are a novel photosensitive poly(amide)imide precursor capable of being manufactured easily, having excellent shelf stability and high sensitivity, and containing less impurities, a process for manufacturing the above-mentioned precursor, a photosensitive polymer composition containing the precursor, and a process for forming a patterned poly(amide)imide film by the use of the photosensitive polymer composition. The photosensitive polymer has an inherent viscosity of 0.1 to 5 dl/g and contains a repeating unit represented by the following general formula (I), ##STR1## wherein R.sup.1 is a trivalent or tetravalent carbon cyclic aromatic group or hetrocyclic group; R.sup.2 is an aliphatic group having at least 2 carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbon cyclic aromatic group, a heterocyclic group or a polysiloxane group; R.sup.3 is a divalent organic group; R.sup.4 is --R.sup.3 --SH, a hydrogen atom or a monovalent organic group; m is independently 1 or 2; n is independently 0 or 1; and m and n satisfy 1.ltoreq.m+n.ltoreq.2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.