Wafer holder method and apparatus in a vacuum deposition system
US5029555A · kind A · utility
20Cited by
5References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 13, 1989 |
| Grant date | Jul 9, 1991 |
| Priority date | — |
| Expiry date | Sep 13, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for maintaining orientation of a wafer with respect to the wafer holder and a source emission is disclosed. Briefly stated, a wafer is disposed on a wafer holder and displaced in translation only while made to continuously follow a planar closed path which allows the rotation of the wafer with respect to source of emission while keeping the wafer and the wafer holder uniformly aligned with respect to each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.