X-ray lithography beamline method and apparatus
US5031199A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 5, 1990 |
| Grant date | Jul 9, 1991 |
| Priority date | — |
| Expiry date | Jun 5, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/064
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A beamline for X-ray lithography receives a fan of synchrotron radiation with a first mirror which has a concave/concave (toroidal) shape. This mirror collects the fan of X-rays and partially collimates the beam horizontally. The beam is then intercepted by a second refocusing mirror which has a saddle toroidal shape with a major concave radius of curvature and a minor convex radius of curvature. The refocusing mirror acts to collimate the X-rays horizontally and to focus the X-rays vertically. A third flat mirror may be interposed in the beam reflected from the second mirror and can pivot to change the angle of incidence to cause the beam to scan across the image plane. The two toroidal mirrors preferably have approximately a 2 degree grazing angle of incidence of the beam. The two toroidal mirrors act together to provide a very uniform image with a uniform power distribution in the beam. The beamline provides X-rays that are well matched to the mask and photo-resist requirements of X-ray lithography, in that X-rays above and below the desired process window of X-ray energies are substantially attenuated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.