Deep ultraviolet (UV) lens for use in a photolighography system
US5031977A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 27, 1989 |
| Grant date | Jul 16, 1991 |
| Priority date | — |
| Expiry date | Dec 27, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B13/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A deep ultraviolet (UV) lens for use in a photolithography system provides enhanced resolution by using shorter wavelengths of light exposure (in the ultraviolet wavelength). The improved lens includes a meniscus and a first mirror for imaging light in the deep ultraviolet range to the meniscus. The meniscus images the light to a plano-convex lens which is located proximately to the concave surface of the meniscus. The lens further includes a pair of optical elements (prisms) proximately located to the plano surface of the plano-convex lens. The present invention provides for operation in the deep ultraviolet range with a aperture in one embodiment of 0.350.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.