Photoconductor elements with multiphase stress-dampening interlayers
US5032481A · kind A · utility
5Cited by
1References
6Claims
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Key dates
| Filing date | Oct 30, 1989 |
| Grant date | Jul 16, 1991 |
| Priority date | — |
| Expiry date | Oct 30, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/0637
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improved interlayer is provided for use in a photoconductor element between an electrically conductive layer and a charge generation layer of the type where a dye is aggregated in a matrix polymer. The interlayer is a mixture of at least one polyester and at least one polycarbonate. The interlayer provides excellent adhesion between the conductive layer and the charge generation layer and dampens any stress to which the photoconductive element is subjected. Minimal effect on photosensitivity is achieved by optimizing interlayer thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.