Thermal light-sensitive material with combination of fog restrainers
US5032499A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 25, 1989 |
| Grant date | Jul 16, 1991 |
| Priority date | — |
| Expiry date | Jul 25, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/49845
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed a thermal developing light-sensitive material comprising a support and, provided thereon, photographic structural layers comprising at least one layer containing light-sensitive silver halide, said photographic structural layer comprising a compound represented by general formula (1); Formula (1) EQU X.sub.1 --L.sub.1 --A wherein X.sub.1 represents a residual group of a photographic restrainer, L.sub.1 is a mere bonding hand or a divalent group and A is selected from the group consisting of a hydrogen atom, an amino group, a hydroxyl group, a carboxyl group or a salt thereof, a sulfo group or a salt thereof and a sulfin group or a salt thereof; and a compound represented by general formula (2); Formula (2) EQU X.sub.2 --L.sub.2 --B wherein X.sub.2 represents a residual group of a photographic restrainer, L.sub.2 is a divalent group and B is a ballast group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.