Patent · US Expired

Finely, divided, precipitated silica with high structure, method of its preparation and use

US5034207A · kind A · utility

33Cited by
4References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 22, 1990
Grant dateJul 23, 1991
Priority date
Expiry dateJun 22, 2010

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/82
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Finely divided precipitated silica for use as a delustering agent with high structure and a ______________________________________ BET surface (DIN 66 132) of 150 to 350 m.sup.2 /g Stamping density (DIN 53 194) between 60 and 120 g/l DBP absorption number between 3.0 and 4.0 ml/g Particle size distribution at least 70% from 1 to 6 .mu.m ______________________________________ can be prepared by heating a mixture of water and sodium silicate under agitation to a temperature of 70.degree. to 80.degree. C., adding concentrated sulfuric acid into this mixture until half of the alkali present has been neutralized, shearing the reaction mixture and optionally raising the temperature at the same time to 86.degree..+-.5.degree. C. Concentrated sulfuric acid is added after a period of 30 to 120 minutes at a rather high rate until the pH of the silica suspension produced is 3.0 to 3.5. The resulting silica suspension is ultimately filtered off by known filter devices, the silica filter cake washed free of sulfate, and a dry product is ultimately obtained.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.