Installation for etching objects
US5035765A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 20, 1990 |
| Grant date | Jul 30, 1991 |
| Priority date | — |
| Expiry date | Jul 20, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F1/08
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An installation for etching objects comprises at least one etching machine, in which metal is etched from the treated objects, the etching medium being enriched with metal. The etching medium is regenerated again in several electrolytic cells by the removal of metal. The electrolytic cells are brought into operation successively in adaptation to different instantaneous etching capacities of the etching machine ("loads"). This takes place by means of a device, which integrates the quantity of the enriched etching medium removed from the etching machine, over a predetermined period of time. A certain limit value of this integral is associated with each electrolytic cell; if this limit value is exceeded, the corresponding electrolytic cell is activated. In this way, the total capacity of the respective electrolytic cells in operation is adapted to the instantaneous load of the etching machine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.