Radiation-sensitive mixture

US5035979A · kind A · utility

Assignee

• BASF SE

Inventors

• Son Nguyen-Kim · Hemsbach, DE
• Gerhard Hoffmann · Otterstadt, DE
• Reinhold Schwalm · Monsheim, DE

Key dates

• Filing date: Oct 17, 1989
• Grant date: Jul 30, 1991
• Expiry date: Oct 17, 2009

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to a radiation-sensitive mixture essentially consisting of PA0 (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, PA0 (b) a compound which upon irradiation forms a strong acid and PA0 (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, where the organic compound (c) is a malonic acid ester. This radiation-sensitive mixture may be used to prepare photoresists.