Radio frequency ion beam source
US5036252A · kind A · utility
62Cited by
9References
38Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 24, 1989 |
| Grant date | Jul 30, 1991 |
| Priority date | — |
| Expiry date | Apr 24, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/08
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A monoenergetic ion source for the generation of an ion beam is described with the ion energies which lie below 100 eV and also above 5 keV being capable of being freely selected so that the whole range of intermediate energies and independently of the selected ion current density with the aid of the operating parameters of the source. The ion current density is so freely adjustable independently of the ion energy. The ion source is provided with an optical beam focussing system and can in particular also be used to produce metal ions. This ion source also makes a special coating process possible which is likewise described here.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.