CVD apparatus
US5036794A · kind A · utility
7Cited by
8References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 23, 1990 |
| Grant date | Aug 6, 1991 |
| Priority date | — |
| Expiry date | Mar 23, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0262
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A CVD apparatus in which a reaction chamber includes a pair of electrodes which define a plasma generating space therebetween. A metallic enclosure surrounds the plasma generating space thereby preventing plasma which has been produced within the space from escaping. The enclosure can be utilized to support one or more substrates to be coated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.