Plasma processing apparatus including an electromagnet with a bird cage core
US5038013A · kind A · utility
5Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 3, 1990 |
| Grant date | Aug 6, 1991 |
| Priority date | — |
| Expiry date | Aug 3, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32688
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma etching apparatus comprises a chamber, a holding table for holding samples, such as a semiconductor substrate to be etched, in the chamber, a plasma-generating device for generating a plasma within the chamber, and a magnetic-field-forming device which forms a magnetic field perpendicular to the surface of the sample placed on the holding table and parallel the inner wall of the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.