Method of coating silicon particles
US5041308A · kind A · utility
7Cited by
0References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 13, 1989 |
| Grant date | Aug 20, 1991 |
| Priority date | — |
| Expiry date | Dec 13, 2009 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/0272
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An apparatus for heating polycrystalline silicon, in which polycrystalline silicon of semiconductor grade placed in the reaction vessel is directly heated by means of a heater outside of the reaction vessel where the inner surface of the reaction vessel is formed of graphite coated with highly pure silicon and having a thickness of 100 microns or more.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.