Photosensitive material and image forming method
US5041369A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 13, 1989 |
| Grant date | Aug 20, 1991 |
| Priority date | — |
| Expiry date | Mar 13, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive material comprises a photosensitive and heat-developable element, and further a light-to-heat conversion element or a nonlinear optical function element. The photosensitive and heat-developable element comprises at least a photosensitive silver halide, an organic silver salt and a reducing agent. The light-to-heat conversion element comprises at least one of an inorganic metal and an organic coloring matter. The nonlinear optical function element comprises a comprises a compound selected from the group consisting of an inorganic crystal, an organic crystal, a polymer, a polymeric liquid crystal, a polymeric composition and a polymeric liquid crystal composition. An image forming method employing the photosensitive material comprises the steps of imagewise exposing the material by use of a laser beam, heating the material and forming a polymer image on the material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.