Semiconductor wafer carrier design
US5042423A · kind A · utility
9Cited by
17References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 20, 1988 |
| Grant date | Aug 27, 1991 |
| Priority date | — |
| Expiry date | Dec 20, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67346
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A carrier for use in a continuous chemical vapor deposition reactor system has a lid with tapered edges which match the sides of a recess in the carrier in which the lid resides during processing of the semiconductor to provide a precise fit for the lid and to minimize thermal stresses in the carrier, the lid and the lid-carrier assembly due to extreme heat during processing of the semiconductor wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.