Optical profiler for films and substrates
US5042949A · kind A · utility
Inventors
Key dates
| Filing date | Mar 17, 1989 |
| Grant date | Aug 27, 1991 |
| Priority date | — |
| Expiry date | Mar 17, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0608
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical non-contact surface profiler for determining (i) the surface profile of a transparent layer on a light-absorbing or opaque substrate, (ii) the surface profile of a light-absorbing or opaque substrate through a transparent layer, and (iii) the thickness profile of a transparent layer on a light-absorbing or opaque surface. A microscope alternatively configured in interferometric mode and in spectrophotometric mode provides phase data from an interference pattern and reflectance data from a reflectance pattern, respectively. A photo-sensing device receives the interference patterns and reflectance patterns and inputs the corresponding phase data and reflectance data to a computing device. The computing device processes the data to determine the appropriate surface or film thickness profiles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.