Patent · US Expired

Method of making fused silica by decomposing siloxanes

US5043002A · kind A · utility

106Cited by
5References
26Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 16, 1990
Grant dateAug 27, 1991
Priority date
Expiry dateAug 16, 2010

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03B2207/85
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

This invention relates to the production of high purity fused silica glass through oxidation or flame hydrolysis of a vaporizable silicon-containing compound. More particularly, this invention is directed to the use of vaporizable, halide-free compounds in said production. In the preferred practice, a polymethylsiloxane comprises said vaporizable, halide-free compound.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.