Chemically enhanced thermal oxidation and nitridation of silicon and products thereof
US5043224A · kind A · utility
59Cited by
5References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 5, 1990 |
| Grant date | Aug 27, 1991 |
| Priority date | — |
| Expiry date | Apr 5, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C8/24
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for enhanced thermal oxidation and nitridation of silicon by introduction of fluorine into the oxidation and nitridation ambients.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.