Positive-working quinone diazide photoresist composition containing a dye
US5043243A · kind A · utility
10Cited by
4References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 17, 1989 |
| Grant date | Aug 27, 1991 |
| Priority date | — |
| Expiry date | Nov 17, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive type photoresist composition comprising at least one alkali-soluble resin, at least one quinone diazide compound and a compound of the general formula (I) ##STR1## wherein R.sub.1 and R.sub.2 represents alkyl groups having 1 to 8 carbon atoms or a cycloalkyl group having 1 to 8 carbon atoms, R.sub.3 represents hydrogen, an alkyl group having 1 to 4 carbon atoms or halogen, R.sub.4 represents hydrogen or a cyano group and R.sub.5 represents a cyano group or a carboxyl group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.