Writing atomic scale features with fine tip as source of deposited atoms
US5043578A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 1990 |
| Grant date | Aug 27, 1991 |
| Priority date | — |
| Expiry date | Apr 5, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/857
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Submicron structures are written on a surface by positioning in nanometer range proximity, preferably within current tunneling range, of the surface a scanning tip of a material that emits atoms upon application of an applied voltage of low magnitude. While the tip is maintained within said range, it is moved relative to the surface, and a series of short voltage pulses are concurrently applied between the tip and surface. These pulses cause atoms of tip material to directly transfer to the surface and concurrently cause remaining atoms of tip material to migrate to the tip and continuously reform the tip and maintain its sharp configuration, thereby insuring uninterrupted writing ability. Various tip materials exhibiting low field evaporation potentials may be used; however, gold is preferred if deposition is to be under ambient conditions. Heating the tip enhances the ability of the material to emit atoms. The deposited structures may be selectively sensed or erased by application of appropriate voltages.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.